Effect of metal ion concentration in Ni-W plating solution on surface roughness of Ni-W film

Effect of metal ion concentration in Ni-W plating solution on surface roughness of Ni-W film
复制标题

Ni-W镀液中金属离子浓度对Ni-W镀层表面粗糙度的影响

DOI:
10.7567/jjap.55.01aa22
复制
发表时间:
2016
影响因子:
1.5
通讯作者:
Takeshi Ozawa and Masahiro Arai
Takeshi Ozawa and Masahiro Arai
中科院分区:
物理与天体物理4区
文献类型:
--
作者:
Manabu Yasui;Satoru Kaneko;Masahito Kurouchi;Hiroaki Ito;Takeshi Ozawa and Masahiro Arai

文献摘要

相似文献