Investigation of the photovoltaic performance ofthe polycrystalline silicon p-n junction by aphotothermal measurement
Investigation of the photovoltaic performance ofthe polycrystalline silicon p-n junction by aphotothermal measurement
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光热测量研究多晶硅p-n结的光伏性能
DOI:
10.1016/j.jnoncrysol.2011.11.016
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发表时间:
2012
期刊:
影响因子:
--
通讯作者:
K. Nishioka and T. Ikari
中科院分区:
文献类型:
--
作者:
A. Fukuyama;D. Ishibashi;Y. Sato;K. Sakai,H. Suzuki;K. Nishioka and T. Ikari
For establishing a new methodology for evaluating an effect of the grain boundaries, both the piezoelectric photo-thermal (PPT) and the surface photo-voltage (SPV) measurements of polycrystalline Si p–n junction samples with different volume fractions of grain boundaries were carried out. We could define the signal intensity ratio of SPV/PPT as the key indicator of photovoltaic performance. This is because the PPT signal implies the phonon emitting carrier loss, whereas the SPV denotes the photo-excited carrier accumulation at the surface and the junction interface. It was found that the SPV/PPT ratio and solar cell efficiency decreased with increasing volume fraction of the grain boundaries. Present experimental results demonstrated that one can directly estimate the photovoltaic performance of in-process polycrystalline Si p–n junction wafer by adopting the combination of the PPT and the SPV methodologies without electrodes. Since the PPT detects the non-radiative recombination process, present methodology and the laser-beam-induced current and the photoluminescence imaging methods are complementary. By complementary use of these methods, it becomes possible to investigate the characteristic of grain boundary.