Free-form optics for non-idealized light sources in 3D: a phase-space approach
Free-form optics for non-idealized light sources in 3D: a phase-space approach
复制标题
3D 中非理想化光源的自由曲面光学:相空间方法
DOI:
10.1117/12.2311995
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发表时间:
2018
期刊:
影响因子:
--
通讯作者:
P.Loosen
中科院分区:
文献类型:
--
作者:
A. Völl;R. Wester;P. Buske;M. Berens;J. Stollenwerk;P.Loosen
Free-form optics have been proven to be a very powerful and efficient illumination strategy with applications ranging from automotive and architecture illumination to laser beam shaping. State of the art free-form optics design methods assume that the light has zero étendue, which is for example given if it is emitted from a point source or perfectly collimated. In some cases, this assumption is not valid and designing free-form optics with a zero-étendue method and using a non-zero étendue source will result in a blurring effect for sharp edges in the irradiance pattern. In previous work1, we derived an integral formulation for the irradiance distribution on a target screen for a non-zero étendue source. Furthermore, we showed for a 2D-application that it is possible to combine this irradiance calculation method with a surface optimization routine to obtain free-form optics that also take into account a non-zero étendue. As a continuation, we extend this approach to three dimensions. To this end, we show how the integral formulation can be approximated numerically in three dimensions and we present an optimization method for the free-form optics. We demonstrate the performance of the algorithm by using two different test cases. For the second test case, we additionally present how the achieved irradiance distribution varies with the étendue of the source.
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影响因子:
3.8
作者:
A. Hirst;J. Muschaweck
通讯作者:
J. Muschaweck
影响因子:
3.8
作者:
Zexin Feng;Lei Huang;G. Jin;M. Gong
通讯作者:
Zexin Feng;Lei Huang;G. Jin;M. Gong
DOI:
10.1117/12.2026516
发表时间:
2013
期刊:
影响因子:
--
作者:
Berens M;Bruneton A;Bäuerle A;Traub M;Wester R;Stollenwerk J;Loosen P
通讯作者:
Loosen P
影响因子:
3.8
作者:
C. Bösel;H. Gross
通讯作者:
C. Bösel;H. Gross
DOI:
10.1016/j.microrel.2011.04.007
发表时间:
2012
期刊:
Microelectron. Reliab.
影响因子:
--
作者:
Y. Lo;K. Huang;X. Lee;Ching
通讯作者:
Ching