Selective etching of ZnTe in HF:H2O2:H2O solution: Interpretation of extended defect-related etch figures
Selective etching of ZnTe in HF:H2O2:H2O solution: Interpretation of extended defect-related etch figures
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HF:H2O2:H2O 溶液中 ZnTe 的选择性蚀刻：扩展缺陷相关蚀刻图的解释
DOI：
10.1002/crat.201400265
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发表时间：
2015
影响因子：
1.5
通讯作者：
Jie Wanqi
中科院分区：
文献类型：
--
作者：
Yang Rui;Jie Wanqi
HF：H2 O2：H2O溶液（40%wt. HF：30 wt.% H_2O_2：H_2O，体积比3：2：1）对碲化锌（ZnTe）晶体中的扩展缺陷（线缺陷、面缺陷和体缺陷）进行了研究。根据蚀刻图案的尺寸、形状和分布来分析蚀刻图案。蚀刻图形，无论是在坑和小丘的形状与高分辨率，显示由各自的面的对称性控制的形式产生。观察到两种不同尺寸的凹坑，较大尺寸的凹坑对应于穿透表面的位错，然而，较小尺寸的织构凹坑产生在无缺陷区域上，其作为各面上的标准凹坑。晶界、亚晶界、位错壁、孪晶和层错等面缺陷都能清晰显示。蚀刻剂的另一个基本特征是，它可以有效地溶解富Te相（Te夹杂物/沉淀物），这使得它有希望揭示这种体积缺陷的形状。
HF:H2O2:H2O solution (40%wt.HF: 30wt.%H2O2: H2O, 3:2:1 by volume) was used to reveal extended defects (line, face and volume defects) in bulk ZnTe crystals grown from Te solution. The etch patterns were analyzed based on their size, shape and distribution. The etch figures, both in the shape of pits and hillocks with high resolution, show forms controlled by the symmetries of the respective faces were produced. Two different sizes of pits were observed, the larger‐size pits correspond to dislocations penetrating the surface, however, the smaller‐size texture pits are produced on the defect‐free region, which serve as standard pits on respect faces. The face defects, such as grain boundaries, sub‐grain boundaries, dislocation walls, twins and stacking faults, can be all displayed clearly. Another essential feature of the etchant is that, it can effectively dissolve Te‐rich phase (Te inclusion/precipitates), which makes it promising to reveal the shape of this volume defect.