LIQUID-PHASE EPITAXY
LIQUID-PHASE EPITAXY
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DOI:
10.1007/bf00323650
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发表时间:
1991-06-01
影响因子:
2.7
通讯作者:
KUPHAL, E
中科院分区:
文献类型:
--
作者:
KUPHAL, E
This paper presents a comprehensive review of the method of liquid phase epitaxy (LPE) of semiconductors. In Sect. 1 the physical principles including diffusion-limited growth and solid-liquid phase diagrams are treated in detail. In Sect. 2 technological aspects and various kind of growth systems including industrial versions are described. Section 3 summarizes the relevant properties of LPE grown layers. Section 4 contains the application of LPE to the material system InP/InGaAs/InGaAsP as a model system. In Sect. 5 the advantages and weaknesses of LPE with respect to device applications in comparison with competing methods are discussed, and finally we attempt to predict the future direction of LPE.