In situ monitoring of hydrogen desorption from silicon nanoparticles dispersed in a nonthermal plasma
In situ monitoring of hydrogen desorption from silicon nanoparticles dispersed in a nonthermal plasma
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原位监测分散在非热等离子体中的硅纳米粒子的氢解吸
DOI：
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发表时间：
2016
期刊：
影响因子：
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通讯作者：
L. Mangolini
中科院分区：
文献类型：
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作者：
T. Lopez;L. Mangolini
本文讨论了利用傅里叶变换红外吸收光谱监测悬浮在氩氢非热等离子体中的硅纳米颗粒的氢表面覆盖率。通过在第一等离子体反应器中从硅烷中生长纳米颗粒，并通过由红外光束相交的第二等离子体反应器来测量表面硅氢化基团的吸收。利用这种装置，作者获得了地面终端的原位、飞行测量。他们发现氢的表面覆盖率随着等离子体功率的增加而下降。对收集到衬底上并暴露于相同等离子体的颗粒进行的对照实验表明，氢的损失是热诱导解吸过程的结果。通过使用氢与硅表面相互作用的既定动力学速率，作者估计纳米颗粒的温度在650 - 750k范围内。这项工作提供了额外的实验证据……
In this paper, the authors discuss the use of Fourier transform infrared absorption spectroscopy to monitor the hydrogen surface coverage of silicon nanoparticles suspended in an argon-hydrogen nonthermal plasma. The absorption from surface silicon hydride groups is measured by growing nanoparticles from silane in a first plasma reactor and by passing them through a second plasma reactor intersected by an infrared beam. Using this setup, the authors obtain an in situ, in-flight measurement of the surface termination. They have found that hydrogen surface coverage declines at increasing plasma power. Control experiments performed on particles collected onto a substrate and exposed to the same plasma indicate that the loss of hydrogen is the result of a thermally induced desorption process. By using well-established kinetic rates for hydrogen interactions with silicon surfaces, the authors estimate the nanoparticle temperature to be in the 650–750 K range. This work provides additional experimental evidence...