Skyrmion confinement in ultrathin film nanostructures in the presence of Dzyaloshinskii-Moriya interaction
Skyrmion confinement in ultrathin film nanostructures in the presence of Dzyaloshinskii-Moriya interaction
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DOI：
10.1103/physrevb.88.184422
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发表时间：
2013-11-20
影响因子：
3.7
通讯作者：
Thiaville, A.
中科院分区：
文献类型：
--
作者：
Rohart, S.;Thiaville, A.
我们研究了由于出现在超薄膜界面的 Dzyaloshinskii-Moriya 相互作用 (DMI) 导致的纳米结构中微磁构型的改变。我们表明，这种相互作用会导致微磁边界条件，使边缘的磁化强度弯曲。我们探索了几种允许分析计算的超薄膜纳米结构案例（一维系统、畴壁、摆线和斯格明子），与完全数值计算进行比较，并表明可以对这种类型的微磁学有很好的物理理解。我们特别关注限制在圆形纳米点中的斯格明子，并表明边缘允许在大范围的 DMI 参数下隔离单个斯格明子。
We study the modification of micromagnetic configurations in nanostructures, due to the Dzyaloshinskii-Moriya interaction (DMI), that appear at the interface of an ultrathin film. We show that this interaction leads to micromagnetic boundary conditions that bend the magnetization at the edges. We explore several cases of ultrathin film nanostructures that allow analytical calculations (one-dimensional systems, domain walls, cycloids, and skyrmions), compare with fully numerical calculations, and show that a good physical understanding of this type of micromagnetics can be reached. We particularly focus on skyrmions confined in circular nanodots and show that edges allow for the isolation of single skyrmions for a large range of the DMI parameter.