CMOS-compatible and fabrication-tolerant MMI-based polarization beam splitter
CMOS-compatible and fabrication-tolerant MMI-based polarization beam splitter
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DOI：
10.1016/j.optcom.2014.08.060
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发表时间：
2015-01-15
影响因子：
2.4
通讯作者：
Li, Hongbin
中科院分区：
文献类型：
--
作者：
Yin, Mei;Yang, Wei;Li, Hongbin
提出并实现了一种基于多模干涉（MMI）耦合器的偏振分束器（PBS），该偏振分束器具有良好的可加工性，并与标准硅光子铸造工艺完全兼容。在220 nm硅条形波导上的PBS小到4.2 μ m × 132.64 μ m。此外，对于TE（TM）模式，模拟的宽度、长度和刻蚀深度的制造公差分别大于100 nm（80 nm）、5 μ m（5.65 μ m）和60 nm（120 nm）。实验结果表明，该器件的带宽约为26 nm，消光比优于15 dB。(C)2014爱思唯尔有限公司版权所有。
A compact multimode interference (MMI) coupler based polarization beam splitter (PBS) is proposed and realized, which is fabrication-tolerant and fully compatible with standard silicon photonic foundry processes. The PBS On the 220 nm silicon strip waveguide is as small as 4.2 mu m x 132.64 mu m. Besides, the simulated fabrication tolerances of the width, the length and the etching depth are more than 100 nm (80 nm), 5 mu m (5.65 mu m) and 60 nm (120 nm) for TE (TM) mode, respectively. In addition, the experimental results demonstrate that the bandwidth is about 26 nm with the extinction ratio better than 15 dB. (C) 2014 Elsevier B.V. All rights reserved.