Polarizing beam splitter of a deep-etched fused-silica grating.
Polarizing beam splitter of a deep-etched fused-silica grating.
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DOI：
10.1364/ol.32.001299
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发表时间：
2007-05
期刊：
影响因子：
3.6
通讯作者：
Bo Wang;Changhe Zhou;Shunquan Wang;Jijun Feng
中科院分区：
文献类型：
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作者：
Bo Wang;Changhe Zhou;Shunquan Wang;Jijun Feng
描述了一种高效的深腐蚀二元相位熔融石英光栅偏振分束器（PBS），TE和TM偏振波主要分别在-1级和0级衍射。为了获得高的消光比和衍射效率，采用严格的耦合波分析方法对光栅的深度和周期进行了优化，并利用TE/TM偏振模式的有效折射率模型法对优化结果进行了解释。采用全息记录技术和电感耦合等离子体刻蚀技术制作了熔融石英PBS光栅。在波长为1550 nm处，TE偏振波的衍射效率在-1级接近80%，TM偏振波的衍射效率在0级超过85%。由于其结构紧凑，制作工艺简单，适合批量复制，深蚀刻熔融石英光栅作为PBS应该是一个有用的器件，在实际应用中。
We described a highly efficient polarizing beam splitter (PBS) of a deep-etched binary-phase fused-silica grating, where TE- and TM-polarized waves are mainly diffracted in the -1st and 0th orders, respectively. To achieve a high extinction ratio and diffraction efficiency, the grating depth and period are optimized by using rigorous coupled-wave analysis, which can be well explained based on the modal method with effective indices of the modes for TE/TM polarization. Holographic recording technology and inductively coupled plasma etching are employed to fabricate the fused-silica PBS grating. Experimental results of diffraction efficiencies approaching 80% for a TE-polarized wave in the -1st order and more than 85% for a TM-polarized wave in the 0th order were obtained at a wavelength of 1550 nm. Because of its compact structure and simple fabrication process, which is suitable for mass reproduction, a deep-etched fused-silica grating as a PBS should be a useful device for practical applications.