Study on Fundamental Predominance in Shave-off Depth Profiling
Study on Fundamental Predominance in Shave-off Depth Profiling
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削削深度剖析的基本优势研究
DOI：
10.1002/sia.5044
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发表时间：
2013
影响因子：
1.7
通讯作者：
M. Fujii and M. Owari
中科院分区：
文献类型：
--
作者：
Takeo Ito;Kazuhiro Ozawa;Tsuyoshi Watanabe;Takeshi Sagiya;小澤和浩・鷺谷威;M. Fujii and M. Owari
Shave‐off深度剖析通过使用聚焦离子束微加工工艺来提供深度剖析，实现具有纳米级深度分辨率的高精度深度剖析。该方法具有绝对深度刻度、精确深度剖面、适用于粗糙表面和/或异质界面等特点。虽然这种方法具有显著的特点，但由于刮削扫描模式具有一次离子束相对于样品的独特位置，因此对刮削深度轮廓的基本优势的定量评估仍然不足。在这项研究中，溅射产额和混合效应下的剃须扫描模式下进行了研究，使用分子动力学模拟。在刮除和光栅模式下得到的溅射产额与实验结果符合良好。溅射产额和均方根位移的结果表明，与光栅扫描模式相比，刮除扫描模式具有较高的溅射产额和较低的混合效应。此外，标记原子的分布清楚地显示了混合的过程。版权所有© 2012约翰威利父子有限公司.
Shave‐off depth profiling achieves the highly precise depth profiling with nanometre‐scaled depth resolution by using a focused ion beam micro‐machining process to provide depth profile. This method has its own features: absolute depth scale, pinpoint depth profiling and application for rough surface and/or hetero interface. Although this method has significant features, the quantitative evaluation of the fundamental predominance in shave‐off depth profiling is still insufficient because the shave‐off scanning mode has a distinctive position of the primary ion beam against the sample. In this study, the sputtering yield and the mixing effects under the shave‐off scan mode were investigated using molecular dynamics simulation. The obtained sputtering yields under the shave‐off and the raster modes accorded well with experimental results. The results of sputtering yields and root mean square displacement suggested that the shave‐off scan mode has a high sputtering yield and low mixing effects compared with the raster scan mode. In addition, the distribution of the marker atoms clearly showed the process of mixing. Copyright © 2012 John Wiley & Sons, Ltd.