Measurement of the dc Kerr and electrostrictive phase modulation in silica
Measurement of the dc Kerr and electrostrictive phase modulation in silica
复制标题
二氧化硅中直流克尔和电致伸缩相位调制的测量
DOI：
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
G. Kino
中科院分区：
文献类型：
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作者：
A. Liu;M. Digonnet;G. Kino
据我们所知，我们首次用偏振分辨的方法测量了二氧化硅中电子和电致伸缩对直流克尔系数的频率依赖性。在声学共振时，垂直极化相移是平行极化相移的2.3倍，证实了强电致伸缩的存在。我们发现相移测量结果与偏振和频率相关的理论模型符合得很好。分析表明，直流克尔系数χ1111(3)(-ω；ω，0，0)为1.9×10-22km2/V2。根据这些结果，对器件声学共振附近的极化二氧化硅器件的电致伸缩贡献预计为R33，Es=28 Pm/V，比电子克尔电光系数R33，Kerr=0.2 Pm/V大一个数量级。
We report, to our knowledge, the first polarization-resolved measurement of the frequency dependence of both the electronic and the electrostrictive contributions to the dc Kerr coefficient in silica. At the acoustic resonance the perpendicular polarization phase shift is a factor of 2.3 times greater than in the parallel polarization, confirming the presence of strong electrostriction. We find good agreement between the phase-shift measurements and theoretical models of both the polarization and frequency dependence. The analysis indicates the dc Kerr coefficient χ1111(3)(-ω;ω, 0, 0) to be 1.9×10-22 m2/V2. From these results the electrostrictive contribution to a poled-silica device near the device acoustic resonance is expected to be r33,Es=28 pm/V, over an order of magnitude greater than the electronic Kerr electro-optic coefficient r33,Kerr=0.2 pm/V.