Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size
Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size
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PS-b-PMMA 的后聚合改性可实现亚 10nm 特征尺寸的定向自组装
DOI：
10.1117/12.2515933
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发表时间：
2019
期刊：
影响因子：
--
通讯作者：
Satoh Toshifumi
中科院分区：
文献类型：
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作者：
Isono Takuya;Yoshida Kohei;Mamiya Hiroaki;Miyagi Ken;Yamazaki Akiyoshi;Satoh Toshifumi
本文描述了酯-酰胺交换反应，用于对聚苯乙烯-嵌段-聚（甲基丙烯酸甲酯）（PS-b-PMMA）进行简单有效的后聚合改性，以生产高χ/低N PS-b-PMMA类似物，该类似物表现出具有亚10 nm尺度特征的微相分离。使用各种胺进行酯-酰胺交换反应，将少量甲基丙烯酰胺单元引入母体 PS-b-PMMA 的 PMMA 嵌段中。小角X射线散射分析表明，少量的甲基丙烯酰胺单元会导致块之间的不相容性显着增加。因此，我们通过对低分子量PS-b-PMMA进行简单的后聚合改性，获得了域间距小至11.1 nm的层状微相分离结构。更重要的是，使用具有 PS 刷层的拓扑预图案化硅基板演示了改性 PS-b-PMMA 的定向自组装，从而突出了所提出的方法在下一代纳米光刻应用中的实用性。
This paper describes the ester-amide exchange reaction for the facile and efficient post-polymerization modification of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) to produce high-χ/low-N PS-b-PMMA analogues that exhibit a microphase separation with features on a sub-10 nm scale. Various amines were used for the ester-amide exchange reaction to introduce a small number of methacrylamide units into the PMMA block of the parent PS-b- PMMA. A small-angle X-ray scattering analysis revealed that a tiny amount of the methacrylamide units led to a significant increase in the incompatibility between the blocks. Consequently, we obtained a lamellar microphaseseparated structure with a domain-spacing as small as 11.1 nm through the simple post-polymerization modification of low-molecular-weight PS-b-PMMA. More importantly, directed self-assembly for the modified PS-b-PMMAs was demonstrated using topographically prepatterned silicon substrates with a PS brush layer, thus highlighting the practical utility of the proposed method in next generation nanolithographic applications.