Pore Width-Sensitive Filling Mechanism for CCl4 in a Graphitic Micropore by Computer Simulation
Pore Width-Sensitive Filling Mechanism for CCl4 in a Graphitic Micropore by Computer Simulation
复制标题
计算机模拟石墨微孔中 CCl4 的孔宽敏感填充机制
作者：
T. Suzuki;K. Kaneko;K. Gubbins
通过大正则蒙特卡罗模拟在孔宽范围内检查孔宽对石墨狭缝微孔中 CCl4 的吸附等温线和径向分布的影响。
The effect of the pore width on the adsorption isotherm and radial distribution of CCl4 in a graphitic slit micropore was examined by Grand Canonical Monte Carlo simulation over the pore width rang...