Electron Spin Transport in a Metal-Oxide-Semiconductor Si Two-Dimensional Inversion Channel: Effect of Hydrogen Annealing on Spin-Scattering Mechanism and Spin Lifetime
Electron Spin Transport in a Metal-Oxide-Semiconductor Si Two-Dimensional Inversion Channel: Effect of Hydrogen Annealing on Spin-Scattering Mechanism and Spin Lifetime
复制标题
金属氧化物半导体硅二维反转通道中的电子自旋输运:氢退火对自旋散射机制和自旋寿命的影响
DOI:
10.1103/physrevapplied.18.064071
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发表时间:
2022
影响因子:
4.6
通讯作者:
and Ryosho Nakane
中科院分区:
文献类型:
--
作者:
Shoichi Sato;Masaaki Tanaka;and Ryosho Nakane
Electron spin transport in a two-dimensionalinversion channel is experimentally and theoretically studied in terms of electron distribution in the subbands, electron momentum scattering processes, electron momentum lifetime, and spin lifetime. The electrical properties, electron charge transport, and spin transport are investigated by measuring a-based spin metal-oxide-semiconductor field-effect transistor with a 10-μm channel length under various bias and temperature conditions (4, 77, 150, and 295 K). In particular, in our unique procedure, the same device is measured before and after annealing to quantitatively clarify the change in the spin transport with lower and higher electron mobilities, by excluding device-to-device variability. Even when the distribution of electrons in the subbands, electron mobility, and temperature are significantly changed, the spin-flip probability, which is defined as the ratio of electron momentum lifetime to spin lifetime, is nearly constant at approximately 1/25 000, probably due to the Elliot-Yafet mechanism. The estimated spin conservation lengths at various temperatures are increased 2–50 times with increases in both the electron mobility and spin drift. With a high electron mobility ofat 4 K, spin transport with a spin conservation efficiency of 94% is achieved through the 10-μm-long channel.