Low-temperature direct bonding of β-Ga2O3 and diamond substrates under atmospheric conditions
Low-temperature direct bonding of β-Ga2O3 and diamond substrates under atmospheric conditions
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DOI:
10.1063/5.0002068
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发表时间:
2020-04-06
影响因子:
4
通讯作者:
Takagi, Hideki
中科院分区:
文献类型:
--
作者:
Matsumae, Takashi;Kurashima, Yuichi;Takagi, Hideki
Surface-functionalizedbeta -Ga2O3 and diamond substrates were directly bonded by annealing at 250 degrees C in atmospheric air. Prior to bonding, thebeta -Ga2O3 and diamond surfaces were OH-terminated by oxygen plasma irradiation and H2SO4/H2O2 cleaning, respectively. After contacting the OH-terminated surfaces with each other, direct bonding was formed by a thermal dehydration reaction. The annealed specimen had a shear strength of 14MPa because of the generation of chemical bonds betweenbeta -Ga2O3 and diamond surfaces. The analysis of interface structures revealed that thebeta -Ga2O3 and diamond surfaces were atomically bonded without nano-voids, cracks, or any intermediate layer. The beta -Ga2O3 and diamond substrates were bonded without any serious loss in crystallinity except for the outermost surfaces. We believe that thebeta -Ga2O3/diamond heterostructure can contribute to the high-power applications ofbeta -Ga2O3 devices.