Highly Robust Transparent and Conductive Gas Diffusion Barriers Based on Tin Oxide
Highly Robust Transparent and Conductive Gas Diffusion Barriers Based on Tin Oxide
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DOI：
10.1002/adma.201502973
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发表时间：
2015-10-21
影响因子：
29.4
通讯作者：
Riedl, Thomas
中科院分区：
文献类型：
--
作者：
Behrendt, Andreas;Friedenberger, Christian;Riedl, Thomas
报道了透明和导电的气体扩散势垒。原子层沉积法制备的氧化锡(SnOx)薄膜具有极低的水蒸气透过率，其透过率仅为10(-6)g(m(2)d)(-1)，比ITO薄膜提高了6个数量级。SnOx的电导率在湿热条件下(85摄氏度/85%相对湿度(RH))保持较高水平，而氧化锌的电导率迅速下降五个数量级以上。
Transparent and electrically conductive gas diffusion barriers are reported. Tin oxide (SnOx) thin films grown by atomic layer deposition afford extremely low water vapor transmission rates (WVTR) on the order of 10(-6) g (m(2) day)(-1), six orders of magnitude better than that established with ITO layers. The electrical conductivity of SnOx remains high under damp heat conditions (85 degrees C/85% relative humidity (RH)), while that of ZnO quickly degrades by more than five orders of magnitude.