Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas
Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas
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开发真空紫外吸收光谱技术，采用氮分子微放电空心阴极灯测量等离子体中氮原子的绝对密度
DOI：
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
K. Yoneda
中科院分区：
文献类型：
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作者：
S. Takashima;S. Arai;M. Hori;T. Goto;A. Kono;Masafumi Ito;K. Yoneda
我们发展了一种真空紫外吸收光谱（VUVAS）技术，采用高压氮分子（N2）微放电空心阴极灯（N2 MHCL）作为氮原子（N）共振线的光源，用于测量工艺等离子体中N的绝对密度。 进行了N2 MHCL的自吸收和发射谱线的估算，这是绝对N浓度测定所必需的。采用N2 MHCL的VUVAS系统，对电感耦合N2等离子体进行了绝对N密度的测量。
We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N2) microdischarge hollow cathode lamp (N2 MHCL) as a light source of the atomic nitrogen (N) resonance lines for measuring absolute N densities in process plasmas. The estimations of self-absorption and the emission line profiles of the N2 MHCL, which are necessary for absolute N density determination, were carried out. The measurement of absolute N densities have been demonstrated for an inductively coupled N2 plasma using the VUVAS system employing the N2 MHCL.