Estimation of near-E field and far-field radiation pattern with only near-H field measurement by using the Yee scheme

Estimation of near-E field and far-field radiation pattern with only near-H field measurement by using the Yee scheme
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使用 Yee 方案仅通过近 H 场测量来估计近 E 场和远场辐射方向图

DOI:
10.1109/icsmc2.2003.1428199
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发表时间:
2003
期刊:
2003 IEEE International Symposium on Electromagnetic Compatibility, 2003. EMC '03.
影响因子:
--
通讯作者:
Y. Kami
Y. Kami
中科院分区:
--
文献类型:
--
作者:
H. Hirayama;Y. Kami

文献摘要

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近场测量是为了减少电气设备的远场发射。绘制测量场,然后将场强强的区域视为一个步长。然而,在目前的生产设施中,单独绘图不足以减少目前的排放。在本文中,我们提出了一种新的方法,使用Yee计划的近场测量。这种方法使我们能够:1)仅通过H场测量获得E场分布;以及2)仅通过使用测量的H场分布来估计远场辐射图案。实验证明了该方法的有效性
Near-field measurement is done for the purpose of decreasing far-field emission from electric equipment. Measured fields are plotted, and then a region where the field intensity is strong is regarded to be taken a step. However, in current manufacturing facilities, plotting alone is insufficient to reduce the present emissions. In this paper, we propose a new method using the Yee scheme for near-field measurement. This method enables us to: 1) obtain the E-field distribution through only the H-field measurement; and 2) estimate the far-field radiation pattern by using only the measured H-field distribution. Our experiments confirmed the effectiveness of the method