A Photochemical Process Investigation of Slica Thin Films by an Irradiation from an Ar_2^* Excimer Lamp

A Photochemical Process Investigation of Slica Thin Films by an Irradiation from an Ar_2^* Excimer Lamp
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Ar_2^* 准分子灯照射 Slica 薄膜的光化学过程研究

DOI:
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发表时间:
2006
期刊:
Japanese Journal of Applied Physics 45・35
影响因子:
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通讯作者:
Y.Maezono
Y.Maezono
中科院分区:
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文献类型:
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作者:
Tatsuo Nakazawa;Kyoichi Oshida;Morinobu Endo;M.Tsukamoto;Y.Maezono

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