Fabrication of Discrete Polystyrene Nanoparticle Arrays with Controll able Their Structural Parameters
Fabrication of Discrete Polystyrene Nanoparticle Arrays with Controll able Their Structural Parameters
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结构参数可控的离散聚苯乙烯纳米颗粒阵列的制备
DOI：
10.1166/jnn.2011.3910
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发表时间：
2011
影响因子：
--
通讯作者：
Nobuyuki Zettsu
中科院分区：
文献类型：
--
作者：
Shuhei Uchida;Kazuya Yamamura;Nobuyuki Zettsu
我们已经证明了二维周期性非密堆积球形聚苯乙烯纳米颗粒阵列的制备，并且其结构参数（包括直径和颗粒间距）可控。该过程的原理依赖于在基底上的单层紧密堆积的聚苯乙烯纳米颗粒的旋涂辅助胶体自组装的逐步整合，以及随后在大气压氦等离子体下对颗粒的蚀刻。等离子体处理将紧密堆积的纳米颗粒阵列转化为非紧密堆积的排列，保持其原始球形和周期性不变。由于蚀刻过程是各向同性的，因此可以通过处理时间以纳米精度控制结构参数。刻蚀速率强烈依赖于工作压力条件，在250 Torr下的刻蚀速率约为0.001。比760 Torr快3倍。工作气压的影响表明，中性氦自由基和光子扩散的等离子体可能是主要负责的蚀刻。
We have demonstrated the fabrication of two-dimensionally periodic non-close packed arrays of spherical polystyrene nanoparticles with controllable their structural parameters including diameter and interpartcile distance. The principle of this procedure relies on stepwise integration of spin-coat-assisted colloidal self-assembly of the single layer of close-packed polystyrene nanoparticle on a substrate, and subsequent etching of the particle under atmospheric pressure helium plasma. The plasma process converted the close-packed nanoparticle array into non-close-packed arrangement remaining with unchanged their original spherical shape and periodicity. Owing to the etching process underwent isotropically, the structural parameters could be controlled with nanometric accuracy by the treatment time. The etching rate strongly depended on the working pressure conditions, and the etching rate under 250 Torr was ca. 3 times faster than that of the 760 Torr. The effects of the working pressure indicated the neutral helium radicals and photons diffused from the plasma might be primarily responsible for the etching.