Multi-Method High-Resolution Surface Analysis with Slow Electrons
Multi-Method High-Resolution Surface Analysis with Slow Electrons
复制标题
使用慢电子的多方法高分辨率表面分析
DOI:
10.1007/978-3-662-07766-5_8
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发表时间:
2003
期刊:
影响因子:
--
通讯作者:
T. Schmidt
中科院分区:
文献类型:
--
作者:
E. Bauer;T. Schmidt
Electron microscopy with fast electrons has reached a high state of sophistication allowing not only structural imaging with atomic resolution but also chemical analysis in the sub-nanometre range and magnetic imaging with Lorentz microscopy and holography below ten nonometres. These possibilities are due to the strong elastic forward scattering, to the signal accumulation along the path of the electron and to the small aberrations of the employed electron optical elements. In surface imaging, the signal must come from a small depth and fast electrons are useful in only a few imaging modes that emphasize the surface features. Examples are weak-beam imaging, secondary electron emission microscopy and reflection electron microscopy, the last being the most versatile.Instead of trying to overcome the low surface sensitivity of fast electrons by employing modes of operation that emphasize the signal contributions from the surface, it appears logical to seek conditions under which electrons interact only with the surface. This is the case at very low electron energies, which led in 1962 to the idea of low-energy electron microscopy (LEEM). The history of this field up to 1993 has been reviewed [1 J and will not be repeated here. Only the principles of the electron-surface interaction, the basic electron-optical problems, the extension of LEEM to Spin-Polarized LEEM (SPLEEM) and, foremost of all, the combination of LEEM with Spectroscopic Photo Emission Electron Microscopy (SPELEEM), the development of which was supported by the Volkswagen Foundation, will be discussed. Imaging can always be combined with local spectroscopy and diffraction so that a very comprehensive surface characterization is possible.
DOI:
10.3131/jvsj2.57.382
发表时间:
2014
期刊:
Journal of The Vacuum Society of Japan
影响因子:
--
作者:
T. Koshikawa;Masahiko Suzuki;T. Yasue;E. Bauer;T. Nakanishi;X. Jin;Y. Takeda
通讯作者:
T. Koshikawa;Masahiko Suzuki;T. Yasue;E. Bauer;T. Nakanishi;X. Jin;Y. Takeda