Plasmonic pressure in profile-modulated and rough surfaces
Plasmonic pressure in profile-modulated and rough surfaces
复制标题
轮廓调制和粗糙表面中的等离激元压力
DOI：
10.1088/1367-2630/18/9/093036
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发表时间：
2016
影响因子：
3.3
通讯作者：
M. Durach
中科院分区：
文献类型：
--
作者：
N. Noginova;M. LePain;V. Rono;S. Mashhadi;R. Hussain;M. Durach
应用电磁动量损失方法预测了不同表面调制幅值下轮廓调制金薄膜中的等离子体阻力效应。证明了金属中等离子体与自由电子相互作用中能量和动量传递的正比例关系适用于具有相对低高度调制幅值的表面。讨论了等效电路模型，该模型可以定性地描述调制表面和随机粗糙度表面中等离子体诱导的电效应。
The electromagnetic momentum loss approach is applied to predict the plasmon drag effect in profile-modulated gold films at different amplitudes of surface modulations. Direct proportionality of energy and momentum transfer in interactions of plasmons and free electrons in metal is proven to be valid for surfaces with relatively low height modulation amplitudes. An equivalent circuit model is discussed, which can provide qualitative description of the plasmon-induced electrical effects in modulated surfaces and surfaces with random roughness.