Magnetic properties and microstructures of Fe–Pt thin films sputter deposited under partial nitrogen gas flow
Magnetic properties and microstructures of Fe–Pt thin films sputter deposited under partial nitrogen gas flow
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DOI：
10.1063/1.1943509
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发表时间：
2005-07
影响因子：
3.2
通讯作者：
C. You;Y. Takahashi;K. Hono
中科院分区：
文献类型：
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作者：
C. You;Y. Takahashi;K. Hono
采用直流磁控溅射方法，在混合气体中制备了厚度约为80 nm的Fe_(100)−_xPtx(x=44、50、56、60、65)薄膜。L10有序化后，在Fe56Pt44非化学计量比成分处获得最大的矫直力。对于等原子和富铂薄膜，溅射过程中的部分氮流由于细小颗粒的团聚和L12FePt3相的存在而恶化了样品的面内矫直力。经过L10有序化处理后，在Ar气氛和Ar+N混合气氛中生长的富铁薄膜都只由L10FCT相组成，氮气的存在增加了薄膜c轴的有序度和强烈的面内择优取向，增加了薄膜的面内矫顽力。通过在溅射过程中引入氮气，连续的Fe56Pt44薄膜在700℃下进行了退火处理，获得了1303kA/m(16.4Koe)的面内矫直磁化强度。
Continuous Fe100−xPtx thin films (x=44, 50, 56, 60, and 65) with a thickness of around 80 nm were prepared by dc magnetron sputtering under a mixture of argon and nitrogen gases. The maximum coercivity was obtained at the Fe56Pt44 off-stoichiometric composition after postannealing for L10 ordering. For the equiatomic and Pt-rich films, partial nitrogen flow during sputtering deteriorated the in-plane coercivity of the postannealed samples due to conglomeration of smaller grains and the presence of L12FePt3 phase. After postannealing for L10 ordering, the Fe-rich films grown in argon and mixture of argon and nitrogen atmospheres are both composed of L10 fct phase only, and the enhancement of the degree of order and strong preferential in-plane alignment of the c axis in the presence of nitrogen causes in-plane coercivity increase. By introducing nitrogen during sputtering, an in-plane coercivity of 1303kA∕m (16.4 kOe) was obtained for the continuous Fe56Pt44 thin film annealed at 700 °C.