X-ray phase imaging using a Gd-based absorption grating fabricated by imprinting technique
X-ray phase imaging using a Gd-based absorption grating fabricated by imprinting technique
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DOI：
10.7567/jjap.55.048003
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发表时间：
2016-03
影响因子：
1.5
通讯作者：
W. Yashiro;Kosuke Kato;Maryam Sadeghilaridjani;A. Momose;T. Shinohara;H. Kato
中科院分区：
文献类型：
--
作者：
W. Yashiro;Kosuke Kato;Maryam Sadeghilaridjani;A. Momose;T. Shinohara;H. Kato
具有几微米间距的高纵横比吸收光栅是X射线光栅干涉测量的关键部件，X射线光栅干涉测量是一种X射线相位成像技术，可以使用紧凑的实验室X射线源进行高灵敏度X射线成像。在这里，我们报告说，X射线相位成像成功地进行了15 keV的使用23 ± 1-µ m的高度，9-µ m间距的吸收光栅（10 × 10 mm 2）的基础上，Gd（Gd 60 Cu 25 Al 15）的金属玻璃压印技术制造。压印技术成本低，生产率高，在不久的将来将被广泛用于制作X射线光栅和中子光栅。
A high-aspect-ratio absorption grating with a pitch of several µm is a key component of X-ray grating interferometery, which is an X-ray phase imaging technique that allows for highly sensitive X-ray imaging with a compact laboratory X-ray source. Here, we report that X-ray phase imaging was successfully performed at 15 keV by using a 23 ± 1-µm-height, 9-µm-pitch absorption grating (10 × 10 mm2) based on Gd (Gd60Cu25Al15) fabricated by a metallic glass imprinting technique. The imprinting technique is cost-efficient and has a high-production rate, and will be widely used for fabricating gratings not only for X-rays but also neutrons in the near future.