Micro-Solid Nitrogen Particulate Spray Cooling Characteristics and its Application to Wafer Cleaning Technology

Micro-Solid Nitrogen Particulate Spray Cooling Characteristics and its Application to Wafer Cleaning Technology
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微固氮颗粒喷雾冷却特性及其在晶圆清洗技术中的应用

DOI:
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发表时间:
2016
期刊:
Proceedings of 1st Asian ICMC and CSSJ 50th Anniversary Conference
影响因子:
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通讯作者:
Jun Ishimoto
Jun Ishimoto
中科院分区:
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文献类型:
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作者:
Ochiai;N.;Ishimoto;J.;Arioka;A.;Yamaguchi;N.;Sasaki;Y.;and Furukawa;N.;柳田佳輝,奥村圭介,藤川俊秀,白岩寛之,矢口久雄;Jun Ishimoto

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