Production of Liquid Cluster Ions for Surface Treatment
Production of Liquid Cluster Ions for Surface Treatment
复制标题
用于表面处理的液体簇离子的生产
DOI：
10.1143/jjap.42.l1032
复制
发表时间：
2003
影响因子：
1.5
通讯作者：
T. Seki
中科院分区：
文献类型：
--
作者：
G. Takaoka;Hidetaka Noguchi;T. Yamamoto;T. Seki
我们开发了一种使用有机液体材料的团簇离子束系统，该系统基于液体团簇离子的不同性质，具有用于表面蚀刻和化学改性的几个优点。利用该系统，乙醇蒸汽通过喷嘴喷射到高真空区域，通过绝热膨胀现象产生乙醇团簇。通过电子轰击法使团簇离子化，并且通过施加加速电压使团簇离子朝向基板加速。用乙醇团簇离子束在不同加速电压下辐照硅基片，即使在几kV的加速电压下也能实现基片表面的化学溅射。此外，加速电压为9kV时的溅射产率比氩离子束的溅射产率大约100倍，溅射表面的平均粗糙度小于1nm。因此，乙醇团簇离子束具有适合于表面处理的独特特性，例如高溅射产率和原子水平的光滑表面。
We have developed a cluster ion beam system using organic liquid materials, which has several advantages for surface etching and chemical modification based on the different properties of liquid cluster ions. By utilizing the system, ethanol vapor was ejected through a nozzle into a high-vacuum region, and ethanol clusters were produced by an adiabatic expansion phenomenon. The clusters were ionized by an electron bombardment method, and cluster ions were accelerated toward a substrate by applying an acceleration voltage. Silicon substrates were irradiated at different acceleration voltages with ethanol cluster ion beams, and chemical sputtering of the substrate surface was achieved even at an acceleration voltage of a few kV. In addition, the sputtering yield at an acceleration voltage of 9 kV was approximately 100 times larger than that by argon ion beams, and the sputtered surface had an average roughness of less than 1 nm. Thus, ethanol cluster ion beams have unique characteristics suitable for surface treatment, such as high sputtering yield and smooth surface at an atomic level.