Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat.
Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat.
复制标题
DOI：
10.1364/ao.45.001368
复制
发表时间：
2006-03
期刊：
影响因子：
1.9
通讯作者：
Ming-Chung Liu;Cheng-chung Lee;M. Kaneko;K. Nakahira;Y. Takano
中科院分区：
文献类型：
--
作者：
Ming-Chung Liu;Cheng-chung Lee;M. Kaneko;K. Nakahira;Y. Takano
用于193 nm单层涂层的MgF2和GDF3材料由电阻加热船在特定的衬底温度下沉积。研究和讨论了薄膜的光学特性(透过率、折射率、消光系数和光学损耗)和微观结构(形貌和晶体结构)。此外，镁氟化物用作低折射率材料，而GDF3用作多层膜的高折射率材料。研究了反射率、应力和激光损伤阈值。结果表明，在300℃的温度下，沉积在衬底上的MgF2和GDF3薄膜具有较高的透过率和193 nm的光学损耗。对于多层膜，应力主要来自于MgF2，吸收主要来自于GDF3。在这些涂层中，16层设计的SUB/(1.4L 0.6H)8/Air显示出最大的LIDT。
MgF2 and GdF3 materials, used for a single-layer coating at 193 nm, are deposited by a resistive-heating boat at specific substrate temperatures. Optical characteristics (transmittance, refractive index, extinction coefficient, and optical loss) and microstructures (morphology and crystalline structure) are investigated and discussed. Furthermore, MgF2 is used as a low-index material, and GdF3 is used as a high-index material for multilayer coatings. Reflectance, stress, and the laser-induced damage threshold (LIDT) are studied. It is shown that MgF2 and GdF3 thin films, deposited on the substrate at a temperature of 300 degrees C, obtain good quality thin films with high transmittance and little optical loss at 193 nm. For multilayer coatings, the stress mainly comes from MgF2, and the absorption comes from GdF3. Among those coatings, the sixteen-layer design, sub/(1.4L 0.6H)8/air, shows the largest LIDT.