Tilt scanning interferometry: a numerical simulation benchmark for 3D metrology.
Tilt scanning interferometry: a numerical simulation benchmark for 3D metrology.
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DOI：
10.1364/ao.48.003184
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发表时间：
2009-06
期刊：
影响因子：
1.9
通讯作者：
G. Galizzi;P. D. Ruiz;G. H. Kaufmann
中科院分区：
文献类型：
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作者：
G. Galizzi;P. D. Ruiz;G. H. Kaufmann
倾斜扫描干涉测量（TSI）是一种新颖的实验技术，可以测量样品体积内的多分量位移场。在本文中，我们提出了一个模拟模型，该模型允许评估在TSI中记录的散斑场，当该技术应用于半透明散射材料的分析时。仿真是基于光学系统的光脉冲响应与入射场振幅的卷积。对模拟成像系统的不同部分进行了识别，并确定了相应的光脉冲响应。为了评估该模型的性能，对一个已知的内部位移场以及实际TSI系统中的照明和检测策略进行了数值模拟。然后，通过在TSI系统中实现的数据处理算法，得到相应的深度分辨的面外和面内相位变化。
Tilt scanning interferometry (TSI) is a novel experimental technique that allows the measurement of multicomponent displacement fields inside the volume of a sample. In this paper, we present a simulation model that allows for the evaluation of the speckle fields recorded in TSI when this technique is applied to the analysis of semitransparent scattering materials. The simulation is based on the convolution of the optical impulsive response of the optical system and the incident field amplitude. Different sections of the simulated imaging system are identified and the corresponding optical impulsive responses are determined. To evaluate the performance of the proposed model, a known internal displacement field as well as the illumination and detection strategies in a real TSI system are numerically simulated. Then, the corresponding depth-resolved out-of-plane and in-plane changes of phase are obtained by means of the data processing algorithm implemented in a TSI system.