Silicon based solvent immersion imprint lithography for rapid polystyrene microfluidic chip prototyping
Silicon based solvent immersion imprint lithography for rapid polystyrene microfluidic chip prototyping
复制标题
用于快速聚苯乙烯微流控芯片原型制作的硅基溶剂浸没压印光刻
DOI：
10.1016/j.snb.2017.03.146
复制
发表时间：
2017-09-01
影响因子：
8.4
通讯作者：
Fan, Xudong
中科院分区：
文献类型：
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作者：
Chen, Jingdong;Wang, Wenjie;Fan, Xudong
在细胞生物学应用的微流体中，聚苯乙烯（PS）优于聚二甲基硅氧烷（PDMS）。然而，PS还没有发现在微流体中的广泛使用，主要是由于缺乏快速成型技术。在这里，我们解决这个问题，通过开发一种硅基溶剂浸没压印光刻（Si-SIIL）技术。硅是刚性的，机械上坚固的，并且与标准微制造工艺高度兼容，因此，是模具的有希望的候选者。使用Si-SIIL证明了宽度小至20 μ m且纵横比高达5的各种PS微流体通道。分析并消除了制造过程中产生的气泡和弯曲。表面粗糙度为约27 nm（rms）。与未处理的PS相比，模塑PS保留了几乎相同的表面性质，其特征在于通过接触角测量和X射线光电子能谱。测试细胞培养以证明Si-SIIL在细胞生物学应用中的效用。结果表明，在Si-SIIL的辅助下，PS可以作为PDMS的替代材料用于构建微流控芯片。(C)2017爱思唯尔B. V.保留所有权利。
Polysrterene (PS) is preferred over polydimethylsiloxane (PDMS) in microfluidics for applications in cell biology. However, PS has not found widespread use in microfluidics due mainly to the lack of rapid prototyping techniques. Here we address this issue by developing a silicon based solvent immersion imprint lithography (Si-SIIL) technique. Silicon is rigid, mechanically robust, and highly compatible with standard microfabrication processes, and therefore, is a promising candidate for molds. Various PS microfluidic channels as small as 20 mu m in width with the aspect ratio as high as 5 were demonstrated using Si-SIIL. Bubbles and bending generated in the fabrication process were analyzed and eliminated. The surface roughness was about 27 nm (rms). Compared to the untreated PS, the molded PS retained almost the same surface properties, as characterized by contact angle measurement and X-ray photoelectron spectroscopy. Cell culture was tested to demonstrate the utility of Si-SIIL in cell biology applications. The results show that PS, with the aid of Si-SIIL, can be an alternative material to PDMS in building microfluidic chips. (C) 2017 Elsevier B.V. All rights reserved.