Design and holographic fabrication of tetragonal and cubic photonic crystals with phase mask: toward the mass-production of three-dimensional photonic crystals
Design and holographic fabrication of tetragonal and cubic photonic crystals with phase mask: toward the mass-production of three-dimensional photonic crystals
复制标题
DOI：
10.1063/1.1865329
复制
发表时间：
2005-02-14
影响因子：
4
通讯作者：
Darmawikarta, K
中科院分区：
文献类型：
--
作者：
Lin, Y;Herman, PR;Darmawikarta, K
介绍了利用位相掩模技术设计和全息制作木桩型光子晶体的方法。通过将光致抗蚀剂暴露在由位相掩模产生的干涉图案中，可以制造具有四方或立方体对称性的三维光子晶体结构。如果由硅制成，这些光子晶体具有高达带隙中心频率27%的全光子带隙。在SU-8光刻胶中实现的光子晶体表现出重叠的结构，因此更稳定的木桩型结构。基于相位掩模的光刻技术与计算机控制的光子晶体制造工艺相结合，可以利用电子工业的标准工具，实现三维光子晶体的大规模生产。(C)2005年美国物理研究所。
We present design and holographic fabrication of the woodpile-type photonic crystals through phase mask techniques. Three-dimensional photonic crystal structures with tetragonal or cubic symmetries are fabricable by exposing the photoresist to the interference patterns generated by the phase masks. These photonic crystals have full photonic band gaps as large as 27% of the gap center frequency if made from silicon. The realized photonic crystal in SU-8 photoresist shows overlapped thus more stable woodpile-type structures. The phase-mask based lithography for the fabrication of the photonic crystals, together with the computer-controlled fabrication process, could take advantage of the standard tools of the electronics industry, leading toward the mass-production of the three-dimensional photonic crystals. (C) 2005 American Institute of Physics.