Self-assembled monolayers prepared from ω-thiophene-functionalized n-alkyltrichlorosilane on silicon substrates
Self-assembled monolayers prepared from ω-thiophene-functionalized n-alkyltrichlorosilane on silicon substrates
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DOI：
10.1016/s0927-7757(99)00338-6
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发表时间：
2000-01-15
影响因子：
5.2
通讯作者：
Adolphi, B
中科院分区：
文献类型：
--
作者：
Appelhans, D;Ferse, D;Adolphi, B
采用吸附法制备了噻吩基功能化的n-烷基三氯硅烷（11-（3-噻吩基）十一烷基三氯硅烷[TUTS]）自组装单分子膜（SAMs），并利用X射线光电子能谱（XPS）、原子力显微镜（AFM）、接触角测量、椭圆偏振仪和扫描电子显微镜（SEM）对其进行了表征。使用接触角和SEM测量，优化膜制备方案，导致可再现的SAM形成，而没有聚硅氧烷颗粒的不利沉积。XPS和椭圆偏振光谱研究证实了SAM形成的存在。AFM结果显示，表面粗糙度Ra小于或等于0.2 nm，这略高于十八烷基三氯硅烷（OTS）自组装膜的相应值。这种基于噻吩的SAM表面可用于噻吩的表面引发聚合。在非相容表面上形成的聚噻吩层在制造中提供了一些实际应用[W。Plieth，A. Fikus，D.阿佩尔汉斯，H. J. Adler，德国专利申请No.2661977（1998）;阿佩尔汉斯，D. Ferse，H. J. Adler，A. Fikus，W. Plieth，B. Aldolphi等人，J.电化学秒（已接受）]。(C)2000 Elsevier Science B. V.保留所有权利。
Self-assembled monolayers (SAMs) of thienyl-functionalized n-alkyltrichlorosilane (11-(3-thienyl)undecyltrichlorosilane [TUTS]) have been prepared by adsorption from solution and characterized by using X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), contact angle measurements, ellipsometry, and scanning electron microscopy (SEM). Using contact angle and SEM measurements, the film preparation protocol was optimized, resulting in reproducible SAM formation with no adverse deposition of polysiloxane particles. XPS and ellipsometry studies confirmed the existence of SAM formation. AFM results show a smooth and homogeneous SAM, with Surface roughness of Ra less than or equal to 0.2 nm, which is slightly higher than the corresponding values for octadecyl-trichlorosilane (OTS) SAMs. Such thiophene-based SAM surfaces can be used for surface-initiated polymerization of thiophene. The resulting formed polythiophene layers at non-compatible surfaces offer some practical applications in manufacturing [W. Plieth, A. Fikus, D. Appelhans, H.-J. Adler, German Patent Application No. 2661977 (1998); D. Appelhans, D. Ferse, H.-J. Adler, A. Fikus, W. Plieth, B. Aldolphi et al., J. Electrochem. Sec. (accepted)]. (C) 2000 Elsevier Science B.V. All rights reserved.