Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering of chromium
Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering of chromium
复制标题
铬调制脉冲功率磁控溅射的时间分辨等离子体表征
DOI：
10.1016/j.surfcoat.2011.01.017
复制
发表时间：
2011
影响因子：
5.4
通讯作者：
Liebig B
中科院分区：
文献类型：
--
作者：
Liebig B
用时间分辨的朗缪尔探针测量了调制脉冲磁控溅射(MPPMS)过程中等离子体性质的时间变化，如电子密度、离子密度、电子温度以及漂移电势和等离子体电势。在Ar气氛(0.53Pa.)中溅射平均功率为650W的铬靶，采用两步放电激励，通过改变提供给靶的电压的调制频率来实现。总脉冲宽度保持在750μ，S，重复频率100 Hz。发现了放电的三个不同阶段，即激发的初始阶段和第二阶段，以及连接这两个稳态的过渡区。在过渡阶段，最大电子密度可达7×1011 cm−3。
Time-resolved Langmuir probe measurements have been employed to investigate the temporal development of the plasma properties, such as electron and ion density, electron temperature as well as the floating and plasma potential, during Modulated Pulsed Power Magnetron Sputtering (MPPMS). A chromium target was sputtered with an average power of 650W in an argon atmosphere (0.53Pa) employing two steps of excitation of the discharge which was realised by altering the modulation frequency of the voltage supplied to the target. The overall pulse duration was kept at 750μs and a repetition frequency of 100Hz was used. Three distinct stages of the discharge, namely the initial and the second step of excitation as well as the transition region which connects both stable states, were found. Maximum electron densities up to 7×1011cm−3were obtained during the transient phase.
影响因子：
3.8
作者：
P. Poolcharuansin;J. Bradley
通讯作者：
P. Poolcharuansin;J. Bradley
高功率脉冲磁控溅射放电中的电子能量分布和等离子体参数
影响因子：
3.8
作者：
A. D. Pajdarová;J. Vlček;P. Kudlacek;J. Lukas
通讯作者：
J. Lukas
影响因子：
3.8
作者：
A. Mishra;P. Kelly;J. Bradley
通讯作者：
A. Mishra;P. Kelly;J. Bradley