A Technique for Local Area Transfer and Simultaneous Crystallization of Amorphous Silicon Layer with Midair Cavity by Irradiation with Near-infrared Semiconductor Diode Laser
A Technique for Local Area Transfer and Simultaneous Crystallization of Amorphous Silicon Layer with Midair Cavity by Irradiation with Near-infrared Semiconductor Diode Laser
复制标题
近红外半导体二极管激光器辐照半空腔非晶硅层局域转移同步结晶技术
DOI：
10.7567/jjap.53.040303
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发表时间：
2014
期刊：
影响因子：
--
通讯作者：
M. Akazawa, and S. Higashi
中科院分区：
文献类型：
--
作者：
K. Sakaike;Y. Kobayashi;S. Nakamura;M. Akazawa, and S. Higashi
