Enhancement of spin-orbit interaction and the effect of interface diffusion in quaternary InGaAsP/InGaAs heterostructures
Enhancement of spin-orbit interaction and the effect of interface diffusion in quaternary InGaAsP/InGaAs heterostructures
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DOI:
10.1103/physrevb.81.115118
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发表时间:
2010-03-01
影响因子:
3.7
通讯作者:
Nitta, Junsaku
中科院分区:
文献类型:
--
作者:
Kohda, Makoto;Nitta, Junsaku
The enhancement of spin-orbit interaction due to simultaneous control of both valence-band offset and electron probability density of the conduction band in a quaternary InGaAsP/InGaAs heterointerface is demonstrated. Weak antilocalization is measured to determine the strength of the Rashba spin-orbit interaction with different gate bias voltages and analyzed by quantum correction of the conductance developed by L. E. Golub [Phys. Rev. B 71, 235310 (2005)]. The Rashba spin-orbit interaction parameter is increased up to alpha=10.4x10(-12) eV m with sheet carrier density N-s=2x10(11) cm(-2). To confirm such a strong effective magnetic field by comparison with the Zeeman energy, we also measure weak antilocalization in the presence of the in-plane magnetic field. A weak antilocalization signal remains up to B-parallel to=3.0 T, resulting in direct evidence of strong spin-orbit interaction in the InGaAsP/InGaAs heterostructure. By taking the interface diffusion at the InGaAsP/InGaAs into account, the obtained Rashba spin-orbit interaction parameter alpha is found to be quantitatively consistent with theoretical calculation derived from the k center dot p theory.