Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography
Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography
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DOI：
10.1063/1.2743900
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发表时间：
2007-06-04
影响因子：
4
通讯作者：
Leighton, C.
中科院分区：
文献类型：
--
作者：
Kubo, T.;Parker, J. S.;Leighton, C.
作者报道了用圆柱形聚苯乙烯-聚异戊二烯-聚乳酸三嵌段模板制备大面积反点阵列。在通过水降解、氧反应离子蚀刻和随后的Ar离子束研磨去除少数聚合物组分以将图案转移到下面的Ni 80 Fe 20膜之后，产生30 nm的反点。重点放在表征的图案转移，这是跟踪使用原子力显微镜，磁力计，和magnetotransfer的组合。它表明，变温磁强计和运输测量是很好的探针的离子铣削到下面的磁性层的进展。(c)2007年，美国物理学会。
The authors report the fabrication of large-area antidot arrays using cylinder-forming polystyrene-polyisoprene-polylactide triblock terpolymer templates. 30 nm antidots were generated after removal of the minority polymer component by aqueous degradation, oxygen reactive ion etching, and subsequent Ar ion beam milling to transfer the pattern to an underlying Ni80Fe20 film. Emphasis was placed on characterization of the pattern transfer, which was tracked using a combination of atomic force microscopy, magnetometry, and magnetotransport. It is demonstrated that variable temperature magnetometry and transport measurements are excellent probes of the progress of the ion milling into underlying magnetic layers. (c) 2007 American Institute of Physics.