Alignment of mesoporous silica on a glass substrate by a rubbing method
Alignment of mesoporous silica on a glass substrate by a rubbing method
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通过摩擦法在玻璃基板上排列介孔二氧化硅
DOI：
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发表时间：
1999
期刊：
影响因子：
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通讯作者：
K. Kuroda
中科院分区：
文献类型：
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作者：
H. Miyata;K. Kuroda
六方介孔二氧化硅颗粒的排列是通过简单的摩擦方法实现的，该方法用于在涂覆在二氧化硅玻璃基板上的非常薄的聚酰亚胺薄膜上排列液晶。在十六烷基三甲基氯化铵存在下，在酸性条件下，通过四乙氧基硅烷的水解合成了介孔二氧化硅。观察细长颗粒的排列，使其长轴平行于摩擦方向。颗粒的最大长径比达到~100。在未经摩擦处理的同一基材上没有观察到颗粒的伸长和排列。使用面内 X 射线衍射和高分辨率扫描电子显微镜证实了六边形通道的方向。在空气中煅烧后，六方介孔结构得以保留，颗粒在基材上的粘附力大大提高。
Alignment of hexagonal mesoporous silica particles was achieved by a simple rubbing method used for the alignment of liquid crystals on a very thin polyimide film coated on a silica glass substrate. Mesoporous silica was synthesized through the hydrolysis of tetraethoxysilane under acidic conditions in the presence of hexadecyltrimethylammonium chloride. The arrangement of the elongated particles was observed with their long axes parallel to the rubbing direction. The maximum aspect ratio of the particles reached ∼100. Both the elongation and alignment of the particles were not observed on the same substrate without the rubbing treatment. The hexagonal channel orientation was confirmed using in-plane X-ray diffraction and high-resolution scanning electron microscopy. The hexagonal mesoporous structure was retained over calcination in air and the adhesion of the particles onto the substrate was greatly improved.