Optical Interference Lithography Using Azobenzene-Functionalized Polymers for Micro- and Nanopatterning of Silicon
Optical Interference Lithography Using Azobenzene-Functionalized Polymers for Micro- and Nanopatterning of Silicon
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DOI：
10.1002/adma.201101888
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发表时间：
2011-09-22
影响因子：
29.4
通讯作者：
Kaivola, Matti
中科院分区：
文献类型：
--
作者：
Kravchenko, Aleksandr;Shevchenko, Andriy;Kaivola, Matti
使用偶氮苯官能化聚合物进行硅微纳米图案化的光干涉光刻 偶氮苯官能化聚合物中的光诱导质量传输在光干涉光刻中被用来制造大面积、周期性的一维和二维硅纳米结构。所展示的技术是一种快速、可靠且经济高效的替代传统基于光刻胶的纳米和微加工方法。该技术的潜在应用范围从光学和光子学到功能材料和涂层。
Optical Interference Lithography Using Azobenzene-Functionalized Polymers for Micro- and Nanopatterning of Silicon Light-induced mass transport in azobenzene-functionalized polymers is exploited in optical interference lithography to fabricate large-area, periodic 1D and 2D silicon nanostructures. The demonstrated technique is a fast, reliable, and cost-effective alternative to conventional photoresist-based methods of nano- and microfabrication. Potential applications of the technique range from optics and photonics to functional materials and coatings.