First result of extracting not only negative but also positive ion beams from RF source for investigating O- and H- applied to novel nano scale processing
First result of extracting not only negative but also positive ion beams from RF source for investigating O- and H- applied to novel nano scale processing
复制标题
从射频源提取负离子束和正离子束以研究 O- 和 H- 应用于新型纳米级加工的第一个结果
DOI：
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发表时间：
2021
期刊：
影响因子：
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通讯作者：
H. Nakano
中科院分区：
文献类型：
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作者：
C. Katsuki;Y. Fujimoto;H. Himura;A. Sanpei;T. Kanki;K. Tsumori;H. Nakano
