Improving the yield and reliability of the bulk-silicon HV-CMOS by adding a P-well

Improving the yield and reliability of the bulk-silicon HV-CMOS by adding a P-well
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DOI:
10.1016/j.microrel.2004.08.007
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发表时间:
2005
期刊:
Microelectron. Reliab.
影响因子:
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通讯作者:
Weifeng Sun;Longxing Shi
Weifeng Sun;Longxing Shi
中科院分区:
其他
文献类型:
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作者:
Weifeng Sun;Longxing Shi

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