Surface Structure on Ar+-Ion Irradiated Graphite by Scanning Probe Microscopy
Surface Structure on Ar+-Ion Irradiated Graphite by Scanning Probe Microscopy
复制标题
扫描探针显微镜观察氩离子辐照石墨的表面结构
DOI：
10.1143/jjap.39.3732
复制
发表时间：
2000
影响因子：
1.5
通讯作者：
M. Yoshimura
中科院分区：
文献类型：
--
作者：
B. An;S. Fukuyama;K. Yokogawa;M. Yoshimura
在退火过程中，由ION剂量为0.5-1.0 keV的AR+离子辐照的高度取向的热解石墨（HOPG）的表面结构以扫描探针显微镜为特征通过扫描隧道显微镜（STM）和原子力显微镜（AFM）观察到离子辐照后的原子力显微镜（AFM），其高度通过STM测量的高度大于通过在敲击模式下通过AFM测量的高度。高于470K。在1270 K退火后，几乎85％的山锁消失了，在退火以上1770 K以上时，它们完全消失了。讨论了在退火期间在Hopg中产生的缺陷行为。
The surface structure of a highly oriented pyrolytic graphite (HOPG), irradiated by Ar+ ions with an ion energy of 0.5–1.0 keV at doses below 5×1011 ions/cm2 during annealing, was characterized by scanning probe microscopy. The ion-induced hillocks were observed by both scanning tunneling microscopy (STM) and atomic force microscopy (AFM) after the ion irradiation, the heights of which, measured by STM, were larger than that measured by AFM in the tapping mode. The hillocks were recovered distinguishably by annealing above 470 K. Almost 85% of the hillocks disappeared after annealing at 1270 K and they disappeared completely after annealing above 1770 K. The behavior of defects produced by ion-irradiation in HOPG during annealing is discussed.