New Route to Three‐Dimensional Photonic Bandgap Materials: Silicon Double Inversion of Polymer Templates
New Route to Three‐Dimensional Photonic Bandgap Materials: Silicon Double Inversion of Polymer Templates
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DOI：
10.1002/adma.200501674
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发表时间：
2006-02
影响因子：
29.4
通讯作者：
N. Tétreault;G. Freymann;M. Deubel;M. Hermatschweiler;F. Pérez-Willard;S. John;M. Wegener;G. Ozin
中科院分区：
文献类型：
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作者：
N. Tétreault;G. Freymann;M. Deubel;M. Hermatschweiler;F. Pérez-Willard;S. John;M. Wegener;G. Ozin
客户折射率对比打开一个完整的光子带隙。在本报告中，我们克服了这些问题，采用了一种新颖的、通用的、可扩展的、经济高效的硅双反转方法合成了第一个硅复制聚合物光子晶体。该方法可应用于任何由直接激光书写（DLW）、全息激光光刻或其组合产生的光刻胶模板。它还结合了一个与模板无关的步骤来微调高指数材料的填充分数，从而允许获得比单独使用模板更大的pbg。该过程包括简单，廉价，工业兼容的步骤，非常适合大规模生产复杂和功能化的光子晶体基de
cient refractive-index contrast to open a complete photonic bandgap. In this report, we overcome these problems by employing a novel, versatile, scalable, and cost-effective silicon double-inversion method to synthesize the first Si replica of a polymeric photonic crystal. This method can be applied to any photoresist template produced by direct-laser writing (DLW), holographic laser lithography, or combinations thereof. It also incorporates a template-independent step to fine-tune the filling fraction of the high-index material, thereby allowing larger PBGs to be obtained than with the template alone. The procedure exclusively comprises straightforward, inexpensive, industry-compatible steps, perfectly suitable for mass production of complex and functionalized photonic-crystal-based de