Si (100) and (110) etching properties in 5, 15, 30 and 48 wt% KOH aqueous solution containing Triton-X-100
Si (100) and (110) etching properties in 5, 15, 30 and 48 wt% KOH aqueous solution containing Triton-X-100
复制标题
Si%20(100)%20和%20(110)%20蚀刻%20性能%20in%205、%2015、%2030%20和%2048%20wt%%20KOH%20水%20溶液%20含%20Triton-X-100
DOI：
10.1007/s00542-017-3368-y
复制
发表时间：
2017
期刊：
影响因子：
--
通讯作者：
M. Takeda and K. Sato
中科院分区：
文献类型：
--
作者：
H. Tanaka;M. Takeda and K. Sato
本文报道了非离子表面活性剂Triton-X-100（Triton）在5、15、30和48%氢氧化钾（KOH）溶液中对Si（100）和（110）的刻蚀作用。在纯的5 wt % KOH溶液中，在Si（100）蚀刻表面上可见微金字塔。在Si（110）腐蚀表面上出现屋顶状的形状。而在添加ppb级Triton的5wt%KOH溶液中，刻蚀后的表面呈镜面状。在5.wt%KOH溶液中加入ppb级的Triton后，刻蚀速率大大降低。然而，对于更高浓度的KOH溶液，Triton效应变得不那么有效。从结果得到的活化能变化可以看出，ppb级的Triton在较低浓度的KOH溶液中吸附在硅表面上，使硅表面的刻蚀过程由反应限制变为扩散限制。另一方面，对于更高浓度的KOH溶液，Triton似乎失去了功能，因为活化能保持在反应限制过程的水平。
This paper reports the effects of non-ionic surfactant, Triton-X-100 (Triton), on the etching of Si (100) and (110) in 5, 15, 30, and 48áwt% potassium hydroxide (KOH) solutions. In a pure 5áwt% KOH solution, micropyramids are visible on the Si (100) etched surface. A roof-like shape appears on the Si (110) etched surface. However, in 5áwt% KOH with addition of ppb-level Triton, the etched surface became mirror-like. Furthermore, the etching rate decreased greatly when a ppb-level of Triton added to 5áwt% KOH solution. However, for more highly concentrated KOH solutions, the Triton effect became less effective. From activation energy change obtained from the results, it is apparent that ppb-level Triton in lower concentration KOH solutions adsorbed onto the silicon surface and made the etching from reaction-limited to diffusion-limited process. On the other hand, for higher concentration KOH solutions, Triton seems to lose the function because the activation energy remained in a level of reaction-limited process.