Topology-constrained synthesis of vector patterns
Topology-constrained synthesis of vector patterns
复制标题
矢量模式的拓扑约束合成
DOI:
10.1145/2661229.2661238
复制
发表时间:
2014-11
影响因子:
6.2
通讯作者:
Sylvain Lefebvre
中科院分区:
文献类型:
--
作者:
周世哲;Changyun Jiang;Sylvain Lefebvre
Decorative patterns are observed in many forms of art, typically enriching the visual aspect of otherwise simple shapes. Such patterns are especially difficult to create, as they often exhibit intricate structural details and at the same time have to precisely match the size and shape of the underlying geometry. In the field of Computer Graphics, several approaches have been proposed to automatically synthesize a decorative pattern along a curve, from an example. This empowers non expert users with a simple brush metaphor, allowing them to easily paint complex structured decorations. We extend this idea to the space of design and fabrication. The major challenge is to properly account for the topology of the produced patterns. In particular, our technique ensures that synthesized patterns will be made of exactly one connected component, so that once printed they form a single object. To achieve this goal we propose a two steps synthesis process, first synthesizing the topology of the pattern and later synthesizing its exact geometry. We introduce topology descriptors that efficiently capture the topology of the pattern synthesized so far. We propose several applications of our method, from designing objects using synthesized patterns along curves and within rectangles, to the decoration of surfaces with a dedicated smooth frame interpolation. Using our technique, designers paint structured patterns that can be fabricated into solid, tangible objects, creating unusual and surprising designs of lamps, chairs and laces from examples.
登录
查看更多内容
影响因子:
2.5
作者:
Pierre-Edouard Landes;B. Galerne;Thomas Hurtut
通讯作者:
Pierre-Edouard Landes;B. Galerne;Thomas Hurtut
DOI:
10.1145/1186822.1073274
发表时间:
2005-07
期刊:
ACM SIGGRAPH 2005 Papers
影响因子:
--
作者:
Jian Sun;Lu Yuan;Jiaya Jia;H. Shum
通讯作者:
Jian Sun;Lu Yuan;Jiaya Jia;H. Shum
DOI:
10.1145/1186822.1073217
发表时间:
2005-07
期刊:
ACM SIGGRAPH 2005 Papers
影响因子:
--
作者:
Y. Lipman;O. Sorkine-Hornung;D. Levin;D. Cohen-Or
通讯作者:
Y. Lipman;O. Sorkine-Hornung;D. Levin;D. Cohen-Or
DOI:
10.1145/2461912.2461956
发表时间:
2013-07
期刊:
ACM Transactions on Graphics (TOG)
影响因子:
--
作者:
M. Lukác;J. Fiser;J. Bazin;Ondrej Jamriska;A. Sorkine-Hornung;D. Sýkora
通讯作者:
M. Lukác;J. Fiser;J. Bazin;Ondrej Jamriska;A. Sorkine-Hornung;D. Sýkora
影响因子:
64.8
作者:
通讯作者:
--