Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengths
Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengths
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极紫外和软X射线波长的高亮度激光康普顿源的设计
DOI：
10.1117/1.jmm.11.2.021124
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发表时间：
2012
期刊：
影响因子：
--
通讯作者：
J. Micro/Nanolith
中科院分区：
文献类型：
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作者：
Kazuyuki Sakaue;Akira Endo and Masakazu Washio;J. Micro/Nanolith
设计了一种用于极紫外/软X射线（EUV/SXR）光刻研究和掩模检测的洁净、高亮度光源。回顾了经典激光-康普顿散射的基本特性，优化了在相对低能量（EUV到SXR）光子产生下的激光和电子束参数。在工作频率为1.3GHz、平均功率为10 kW的连续波电子直线加速器和能量回收直线加速器系统上，采用短脉冲激光器和10.6 μm波长增强因子为600的光学超腔技术，对各部件技术的最新成就进行了评价。将连续电子束和短脉冲激光与超腔增强相结合，设计了6.7nm波长的激光-康普顿光源。讨论了目前组件技术的技术差距，以及任何进一步的发展。
Design of a clean, high-brightness light source is presented for extreme ultraviolet/soft x-ray (EUV/SXR) lithography research and mask inspection. Basic characteristics of classical laser-Compton scattering are reviewed, and the laser and electron beam parameters at relatively low energy (EUV to SXR) photon generation are optimized. Recent achievements in each component technology are evaluated on a continuous wave (CW)-operated electron linac and energy recovery linac system, based on superconducting technologies at a 1.3 GHz operation frequency, 10 kW average power, short pulselaser, and optical super cavity with a 600- enhancement- factor at 10.6 μm wavelength. Combining both the CW electron beam and short pulselaser with super-cavity enhancement,flux andbrightness laser-Compton source is designed at 6.7-nm wavelength. The technological gap in the present component technologies are discussed, as well as any further required developments.