TOC-removal and degradation of pollutants in leachate using a thin-film photoreactor

TOC-removal and degradation of pollutants in leachate using a thin-film photoreactor
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使用薄膜光反应器去除和降解渗滤液中的污染物

DOI:
10.1016/s0043-1354(98)00302-9
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发表时间:
1999
期刊:
影响因子:
12.8
通讯作者:
R. Niessner
R. Niessner
中科院分区:
环境科学与生态学1区
文献类型:
--
作者:
A. Wenzel;A. Gahr;R. Niessner

文献摘要

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本文介绍了采用UV/O_3、UV/H_2O_2、UV/O_3/H_2O_2等高级氧化工艺处理低流量、高离子强度废水的中试装置。该工厂配备了用于溶解气态臭氧的鼓泡塔和特殊设计的薄膜光反应器,可以在不接触辐射源的情况下对高光密度的有机化合物进行光引发降解。将该薄膜装置应用于含有腐植酸的模型溶液中,以根据操作条件去除TOC。此外,一个废物堆填区的渗滤液经处理后,含有高浓度的有毒化合物,例如氯代酚、多环芳烃、多氯联苯、多氯二苯并对二恶英和二苯并对呋喃。UV/O_3是一种处理垃圾渗滤液的有效技术,对苯酚和碳氢化合物的降解率为100%,对联苯的降解率为23-96%,对二恶英和呋喃的降解率至少为74%。
In this paper, a pilot plant is presented providing the treatment of low volume, high ionic strength wastewaters by advanced oxidation processes, such as UV/O3, UV/H2O2and UV/O3/H2O2. The plant is equipped with a bubble column to dissolve gaseous ozone and a special designed thin-film photoreactor, which enables the photoinitiated degradation of organic compounds of high optical density without any contact to the radiation source. The thin-film apparatus was applied to model solutions containing humic acid in order to remove the TOC in dependence on the operating conditions. In addition, a leachate of a waste landfill has been treated containing high concentrations of toxic compounds, e.g. chlorinated phenols, polyaromatic hydrocarbons, polychlorinated biphenyls and polychlorinated dibenzo-p-dioxins and dibenzo-p-furans. The application of UV/O3has been proved to be an effective technique for the treatment of leachate resulting in degradation ratios of 100% for both phenols and hydrocarbons, 23–96% for biphenyls and at least 74% for dioxins and furans.