Behavior of pure gallium in water and various saline solutions.
Behavior of pure gallium in water and various saline solutions.
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DOI：
10.4012/dmj.16.200
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发表时间：
1997-12
影响因子：
2.5
通讯作者：
N. Horasawa;H. Nakajima;S. Takahashi;T. Okabe
中科院分区：
文献类型：
--
作者：
N. Horasawa;H. Nakajima;S. Takahashi;T. Okabe
This study investigated the chemical stability of pure gallium in water and saline solutions in order to obtain fundamental knowledge about the corrosion mechanism of gallium-based alloys. A pure gallium plate (99.999%) was suspended in 50 mL of deionized water, 0.01%, 0.1% or 1% NaCl solution at 24 +/- 2 degrees C for 1, 7, or 28 days. The amounts of gallium released into the solutions were determined by atomic absorption spectrophotometry. The surfaces of the specimens were examined after immersion by x-ray diffractometry (XRD) and x-ray photoelectron spectroscopy (XPS). In the solutions containing 0.1% or more NaCl, the release of gallium ions into the solution was lowered when compared to deionized water after 28-day immersion. Gallium oxide monohydroxide was found by XRD on the specimens immersed in deionized water after 28-day immersion. XPS indicated the formation of gallium oxide/hydroxide on the specimens immersed in water or 0.01% NaCl solution. The chemical stability of pure solid gallium was strongly affected by the presence of Cl- ions in the aqueous solution.
