Study on the assembling reaction of graphite oxide nanosheets and polycations

Study on the assembling reaction of graphite oxide nanosheets and polycations
复制标题

氧化石墨纳米片与聚阳离子的组装反应研究

DOI:
10.1016/j.carbon.2010.02.023
复制
发表时间:
2010-06-01
期刊:
影响因子:
10.9
通讯作者:
Liu, Zong-Huai
Liu, Zong-Huai
中科院分区:
材料科学2区
文献类型:
--
作者:
Ni, Ping;Li, Hongjuan;Liu, Zong-Huai

文献摘要

被引文献

相似文献

通过层层自组装法和絮凝技术研究了氧化石墨(GO)纳米片与聚二烯丙基二甲基氯化铵(PDDA)聚阳离子之间的组装行为,并且还研究了组装后的杂化复合材料的电容性能。GO纳米片和PDDA聚阳离子依次交替吸附形成多层膜,而它们简单混合则产生层状材料。X射线衍射(XRD)表明,多层膜组合产生的XRD布拉格峰的层间距为1.09 nm,这与一层GO纳米片和一层PDDA聚阳离子的厚度之和相符。絮凝材料发生了不同的组装过程;其XRD布拉格峰的多层间距为1.49 nm,这与一层GO纳米片和两层PDDA聚阳离子的厚度之和相符。紫外 - 可见吸收光谱显示由于GO的存在光密度逐渐增强,为多层膜的规则生长提供了有力证据。多层膜和絮凝材料的扫描电子显微镜图像显示出层状特征。絮凝材料表现出良好的电容行为和循环稳定性,比电容值为176 F/g。(C)2010爱思唯尔有限公司。保留所有权利。
The assembling behavior between graphite oxide (GO) nanosheets and polydiallyldimethylammonium (PDDA) polycations was investigated by both layer-by-layer method and flocculated technology, and the capacitive performance of the assembled hybrid composite was also studied. Sequential alternate adsorption of GO nanosheets and PDDA polycations yielded multilayer films while their simple mixing produced lamellar materials. X-ray diffraction (XRD) indicated that the combination of the multilayer film produced XRD Bragg peak having basal spacing of 1.09 nm, which was compatible with the sum of one layer GO nanosheets and one layer of PDDA polycations. A different assembling process took place for the flocculated material; its XRD Bragg peaks had multilayer spacing of 1.49 nm, which was compatible with the sum of one layer GO nanosheets and two layers of PDDA polycations. UV-visible absorption spectra exhibited progressive enhancement of optical density due to GO, providing strong evidence for regular growth of multilayer films. Scanning electron microscopy images of the multilayer film and flocculated material displayed lamellar features. The flocculated material showed good capacitive behavior and cycling stability, and the specific capacitance value was 176 F g(-1). (C) 2010 Elsevier Ltd. All rights reserved.