Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices
Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices
复制标题
溅射气氛清洁度对超高密度磁记录器件薄膜磁性能的影响
DOI：
10.3131/jvsj.41.851
复制
发表时间：
1998
期刊：
影响因子：
--
通讯作者：
M. Takahashi
中科院分区：
文献类型：
--
作者：
M. Takahashi
采用超净溅射工艺制备了Ni-Fe/25 at% Ni-Mn/Ni-Fe三层薄膜介质和自旋阀型薄膜。因此，UC工艺能够控制薄膜的精细结构，并获得优异的磁性能。研究表明，UC工艺上级目前使用的常规工艺，并在薄膜介质和自旋阀头的制造中起着重要的作用。
The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.