Kinetic model of local droplet etching
Kinetic model of local droplet etching
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DOI：
10.1103/physrevb.83.165302
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发表时间：
2011-04-04
影响因子：
3.7
通讯作者：
Heyn, Christian
中科院分区：
文献类型：
--
作者：
Heyn, Christian
在传统的分子束外延过程中，通过使用液态金属液滴在半导体表面中自组织地原位钻纳米孔，代表了异质结构器件设计的新的自由度。这种局部液滴蚀刻的模型是基于核-壳液滴结构。利用该模型，计算了熔滴和衬底形貌的演化。我们证明模型结果和测量形态之间的定量协议。此外，该模型还正确地再现了工艺温度的影响。
The self-organized in situ drilling of nanoholes into semiconductor surfaces by using liquid metallic droplets during conventional molecular beam epitaxy represents a new degree of freedom for the design of heterostructure devices. A model of this local droplet etching is presented that is based on a core-shell droplet structure. With the model, the evolution of the droplet and substrate morphology is calculated. We demonstrate quantitative agreement between model results and measured morphologies. Furthermore, also the influence of the process temperature is correctly reproduced by the model.