X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the OK-edge
X-ray absorption study of the electronic structure of tungsten and molybdenum oxides on the OK-edge
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DOI：
10.1016/s0013-4686(01)00370-x
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发表时间：
2001-04-02
影响因子：
6.6
通讯作者：
Laffon, C
中科院分区：
文献类型：
--
作者：
Purans, J;Kuzmin, A;Laffon, C
本文用X射线吸收谱研究了磁控溅射非晶a-WO_3、a-MoO_3和掺杂a-WO_3：Ir薄膜的氧K边，并与具有不同电子和原子结构的晶态氧化物如单斜m-WO_3、正交a-MoO_3、立方Na_（0.6）WO_3、层状六方h-WO_3和WO_3·H_2 O作了比较。在XANES范围10-15 eV以上的吸收边的变化被解释基于已知的能带结构计算。高能特征与最近原子处的多次散射过程（EXAFS）有关。(C)2001爱思唯尔科技有限公司版权所有。
Magnetron sputtered amorphous thin films a-WO3, a-MoO3 and doped a-WO3:Ir have been studied by X-ray absorption spectroscopy on the oxygen K-edge in comparison with crystalline oxides as monoclinic m-WO3, orthorhombic alpha -MoO3, cubic Na0.6WO3, layered-type hexagonal h-WO3 and WO3.H2O, having Variable electronic and atomic structure. The changes in the XANES ranging 10-15 eV above the absorption edge are interpreted based on the known band-structure calculations. The high-energy features are related to the multiple-scattering processes (EXAFS) at the nearest atoms. (C) 2001 Elsevier Science Ltd. All rights reserved.